I’ve been diving deep into the intricacies of semiconductor manufacturing processes recently, and one aspect that truly caught my attention is the indispensable role of functional water systems, particularly ozone water supply systems.
As we know, semiconductor manufacturing involves a plethora of intricate processes where even the slightest contamination can significantly affect the end product’s quality. This is where functional water systems step in. They ensure that the water used in various processes, such as wafer cleaning or photolithography, is of the highest purity.
Ozone water supply systems, in particular, are gaining traction. Here’s why:
- Superior Cleaning: Ozone-enriched water is an excellent oxidizing agent. This ensures the thorough removal of organic residues, potentially improving the yield.
- Environmentally Friendly: Ozone decomposes into oxygen, meaning there are no harmful residues left behind, making it a greener alternative to many traditional cleaning agents.
- Cost-Effective: With the ability to produce ozone on-site, it reduces the need for transporting and storing other chemicals.
- Efficiency: Ozone water systems can potentially reduce process steps, streamlining the manufacturing process and enhancing throughput.
I’m curious to hear your thoughts on this. Are there any other functional water systems or techniques that you feel are revolutionizing the semiconductor manufacturing process? Or perhaps insights into the challenges or limitations of ozone water systems?
My company, Inquivix Technologies, is an exclusive distributor of ozone water supply systems built in Korea. Samsung and other Korean semiconductor manufacturing factories have installed ozone water supply systems for their cleaning processes.
Check out this video from Asianometry:
